Alto Advanced Defense and Repair Serum

Use in both the AM & PM apply a thin layer to a clean, dry face, neck and décolleté. Protect withsunscreen during the day for additional skincare benefits.

Aqua/Water, Butylene Glycol, Propanediol, Ethylhexyl Olivate, Cetearyl Alcohol, Chlorogenic Acids, Niacinamide, Lauryl Lactate, Dimethyl Isosorbide, Pyrroloquinoline Quinone Allyl Ester, Hydrolyzed Sodium Hyaluronate, Glycyrrhiza Glabra (Licorice) Root Extract, Tetrahexyldecyl Ascorbate, Ergothioneine, Benzylidene Dimethoxydimethylindanone, Arabidopsis Thaliana Extract, Carnosine, Camellia Sinensis Leaf Extract, Vitis Vinifera (Grape) Seed Extract, Theobroma Cacao (Cocoa) Seed Extract, Curcuma Longa (Turmeric) Root Extract, Olea Europaea (Olive) Fruit Extract, Euterpe Oleracea Fruit Extract, Trifluoroacetyl Tripeptide-2, Buddleja Officinalis Flower Extract, Coffea Arabica (Coffee) Leaf Cell Extract, Crocus Sativus Leaf Cell Culture Extract, Superoxide Dismutase, Ubiquinone, Plankton Extract, Micrococcus Lysate, Arginine, Zingiber Officinale (Ginger) Root Extract, Ceramide NP, Ceramide AP, Ceramide EOP, Linoleic Acid, Linolenic Acid, Bisabolol, Tocopherol, Tocopheryl Acetate, Cholesterol, Phytosphingosine, Jojoba Esters, Sodium PCA, Methyl Gluceth-20, Glycerin, Helianthus Annuus (Sunflower) Seed Wax, Acacia Decurrens Flower Wax, Lecithin, Sodium Lauroyl Lactylate, Dicetyl Phosphate, Propanediol Dicaprylate/Caprate, Polyglycerin-3, Ceteth-20 Phosphate, Diisostearyl Malate, Xanthan Gum, Steareth-2, Acacia Senegal Gum, Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate, Carbomer, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Dextran, Ricinoleth-40, Sodium Hydroxide, Citric Acid, Sodium Phytate, Ethylhexylglycerin, Phenoxyethanol.

May be used on dry acne conditions.

It works effectively on all skin types to soften the appearance of wrinkles, support collagen, and protect skin against oxidative damage. It acts as a wake-up call on the skin to fight the visible signs of stress and fatigue that commonly appear in aging skin.